Discard this bullshit, go straight to the source here :
https://pubs.aip.org/aip/pop/article/31/2/023901/3261554/Accuracy-of-the-explicit-energy-conserving
INTRODUCTION
Delivering advanced semiconductor manufacturing capabilities for the coming decades will require an unprecedented control of plasma chemistry and kinetic behavior at the wafer surface. Developing equipment that can enable this control will necessitate increasing reliance on predictive modeling tools which can accurately capture this physics. Such tools, perhaps in combination with artificial intelligence approaches, will also enable the generation of digital twins for plasma equipment and reduce the time for optimization of integrated circuit fabrication recipes (…)